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3 outlets·3 reports·over 41m

TSMC backs ASML’s plan for bigger masks so its newest machines can print AI’s biggest chips

ThinkingNews Desk · how this was written

Samsung and TSMC have committed to using ASML’s High-NA EUV lithography machines, with Samsung targeting deployment by 2028 and TSMC by 2030, joining Intel in the same plan. All four manufacturers will transition from 6-inch to 12-inch photomasks, with testing slated for 2031 and volume production expected in 2033, promising up to a 40% productivity gain.

Written from all 3 reports below, not from any single one.

How it was reported

  1. TechMeme·
    Samsung and TSMC commit to using ASML's High NA EUV machines by 2028 and 2030, joining Intel, with all four agreeing to shift from 6-inch to 12-inch photomasks (Bloomberg)

    Samsung and TSMC have pledged to adopt ASML’s High-NA extreme-ultraviolet lithography tools, targeting deployment by 2028 for Samsung and 2030 for TSMC, aligning with Intel’s similar plan. All four manufacturers will transition from 6-inch to 12-inch photomask formats to support the new equipment.

  2. The Next Web·
    TSMC backs ASML’s plan for bigger masks so its newest machines can print AI’s biggest chips

    ASML will double photomask size from 6 inches to 12 inches so its High-NA EUV tools can expose the ~800 mm2 AI processors in a single shot, eliminating stitching seams and boosting throughput by about 40%. TSMC has joined the initiative, planning High-NA production on 6-inch masks from 2030, a pilot 12-inch mask line in 2031, and full-node deployment by 2033.

  3. Engadget·
    Samsung and TSMC hope AMSL's new machines will help address the chip shortage

    Samsung and TSMC will adopt ASML’s High-NA EUV lithography machines, targeting deployment in 2028 and 2030 respectively, and join Intel in using the technology that has already produced over a million wafers. Both firms also entered a consortium to switch from 6-inch to 12-inch photomasks, with testing slated for 2031 and volume production expected in 2033, promising up to a 40% productivity gain and lower stitching-related costs.

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